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Deposition behaviors of Ru thin films prepared by chemical vapor deposition and their application to the electrodes of the DRAM devices
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- Authors
- Advisor
- 김형준
- Issue Date
- 2004
- Publisher
- 서울대학교 대학원
- Keywords
- Ru ; Ru ; 유기금속화학증착 ; MOCVD ; Pt-doped Ru ; Pt-doped Ru ; Ru ; Ru ; TiN ; TiN ; 결정립성장 ; grain growth ; 열적안정성 ; thermal stability
- Description
- Thesis(doctoral)--서울대학교 대학원 :재료공학부,2004.
- Language
- English
- URI
- http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000055983
https://hdl.handle.net/10371/13644
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