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Deposition behaviors of Ru thin films prepared by chemical vapor deposition and their application to the electrodes of the DRAM devices

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Authors
강상열
Advisor
김형준
Issue Date
2004
Publisher
서울대학교 대학원
Keywords
RuRu유기금속화학증착MOCVDPt-doped RuPt-doped RuRuRuTiNTiN결정립성장grain growth열적안정성thermal stability
Description
Thesis(doctoral)--서울대학교 대학원 :재료공학부,2004.
Language
English
URI
http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000055983

http://hdl.handle.net/10371/13644
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College of Engineering/Engineering Practice School (공과대학/대학원)Dept. of Material Science and Engineering (재료공학부) Theses (Ph.D. / Sc.D._재료공학부)
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