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Deposition behaviors of Ru thin films prepared by chemical vapor deposition and their application to the electrodes of the DRAM devices
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.advisor | 김형준 | - |
| dc.contributor.author | 강상열 | - |
| dc.date.accessioned | 2009-11-19T05:37:58Z | - |
| dc.date.available | 2009-11-19T05:37:58Z | - |
| dc.date.copyright | 2004. | - |
| dc.date.issued | 2004 | - |
| dc.identifier.uri | http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000055983 | eng |
| dc.identifier.uri | https://hdl.handle.net/10371/13644 | - |
| dc.description | Thesis(doctoral)--서울대학교 대학원 :재료공학부,2004. | eng |
| dc.format.extent | xiii, 161 leaves | eng |
| dc.language.iso | en | - |
| dc.publisher | 서울대학교 대학원 | eng |
| dc.subject | Ru | eng |
| dc.subject | Ru | eng |
| dc.subject | 유기금속화학증착 | eng |
| dc.subject | MOCVD | eng |
| dc.subject | Pt-doped Ru | eng |
| dc.subject | Pt-doped Ru | eng |
| dc.subject | Ru | eng |
| dc.subject | Ru | eng |
| dc.subject | TiN | eng |
| dc.subject | TiN | eng |
| dc.subject | 결정립성장 | eng |
| dc.subject | grain growth | eng |
| dc.subject | 열적안정성 | eng |
| dc.subject | thermal stability | eng |
| dc.title | Deposition behaviors of Ru thin films prepared by chemical vapor deposition and their application to the electrodes of the DRAM devices | eng |
| dc.type | Thesis | - |
| dc.contributor.department | 재료공학부 | - |
| dc.description.degree | Doctor | eng |
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