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Morphology controlled growth of GaN microstructures on graphene for flexible light emitting diodes : 그래핀 위에 형태 조절 가능한 질화갈륨 마이크로 구조물과 유연한 발광소자

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dc.contributor.advisor이규철-
dc.contributor.author유동하-
dc.date.accessioned2017-10-31T08:31:45Z-
dc.date.available2017-10-31T08:31:45Z-
dc.date.issued2017-08-
dc.identifier.other000000146374-
dc.identifier.urihttps://hdl.handle.net/10371/138066-
dc.description학위논문 (석사)-- 서울대학교 대학원 자연과학대학 물리·천문학부, 2017. 8. 이규철.-
dc.description.abstractRecently semiconductor materials have great attention for the achievement of technologies such as graphene and GaN. The graphene got a Nobel Prize at 2010. The graphene is suitable for optoelectronic devices such as optically transparency, flexibility, and mechanically strong. Above all things, the graphene can be easily lift off from substrate because bonding between layers is very week. The GaN materials also got a Nobel Prize at 2014. The GaN materials improve the efficiency of light emitting diodes (LEDs). The GaN has many properties such as high carrier mobility, high recombination rate, and long term stability. Therefore, the growth of GaN LEDs on graphene layers have both advantages of graphene and GaN materials. The combination of GaN materials and graphene will lead to wearable display.
The goal of this research is mainly morphology control of GaN microstructures such as pyramid shape, disk shape, and rod shape on graphene layers. However, it is hard to grow GaN microstructures on graphene layers directly. The buffer layer should grow between the graphene and GaN microstructures. Conventionally the GaN LEDs coated on ZnO nanotube or nanowires, but in this research the GaN micro-rods minimize dependency of the buffer layer. Finally, the high aspect ratio GaN micro-rods are grown on thin ZnO nanowall. To fabricate high quality of LEDs, it is important to control quantum wells. The GaN/InxGa1-xN is coated on GaN micro-rods, which has a large area of p-n junctions. Optical characteristics show the spectrum of blue light.
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dc.description.tableofcontentsChapter 1. Introduction 1

Chapter 2. Literature review 3
2.1. Inorganic semiconductor 3
2.2. GaN on graphene layers 4

Chapter 3. Experimental methods 5
3.1. Metal-organic chemical vapor deposition system 5
3.1.1. Gas delivery system 5
3.1.2. Growth chamber, reactants, and dopants 7
3.2. Growth techniques 11
3.2.1. Growth of GaN on c-sapphire substrate 11
3.2.2. Growth of GaN on graphene layer 16
3.3. Characterization system 20
3.3.1. Structural characterization 20
3.3.2. Optical characterization 20
3.3.3. Electrical characterization 22

Chapter 4. Morphology controlled GaN microstructures on graphene layers 26
4.1. Introduction 26
4.2. Morphology controlled GaN microstructures 27
4.2.1. Pyramid shape condition study 27
4.2.2. Disk shape condition study 29
4.2.3. Rod shape condition study 31
4.3. Material characterization 33
4.3.1. Structural characterization 33
4.3.2. Optical characterization 35
4.3.3. Electrical characterization 37
4.4. Summary 39

Chapter 5. Conclusions 40

References 41
Abstract in Korean 43
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dc.formatapplication/pdf-
dc.format.extent5156447 bytes-
dc.format.mediumapplication/pdf-
dc.language.isoen-
dc.publisher서울대학교 대학원-
dc.subjectGaN-
dc.subjectgraphene-
dc.subjectLEDs-
dc.subjectMorphology control-
dc.subject.ddc523.01-
dc.titleMorphology controlled growth of GaN microstructures on graphene for flexible light emitting diodes-
dc.title.alternative그래핀 위에 형태 조절 가능한 질화갈륨 마이크로 구조물과 유연한 발광소자-
dc.typeThesis-
dc.contributor.AlternativeAuthorDongha Yoo-
dc.description.degreeMaster-
dc.contributor.affiliation자연과학대학 물리·천문학부-
dc.date.awarded2017-08-
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