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유도결합 플라즈마 스퍼터링에 의해 제조된 저온 폴리실리콘 박막의 특성에 관한 연구 : Study on the properties of the low temperature poly-silicon films fabricated by ICP assisted DC magnetron sputtering

DC Field Value Language
dc.contributor.advisor이정중-
dc.contributor.author유근철-
dc.date.accessioned2009-11-24T03:00:12Z-
dc.date.available2009-11-24T03:00:12Z-
dc.date.copyright2005.-
dc.date.issued2005-
dc.identifier.urihttp://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000051062kor
dc.identifier.urihttps://hdl.handle.net/10371/14290-
dc.description학위논문(석사)--서울대학교 대학원 :재료공학부,2005.kor
dc.format.extentiv, 40 장kor
dc.language.isoko-
dc.publisher서울대학교 대학원kor
dc.subject저온 폴리실리콘 박막kor
dc.subjectICPkor
dc.subject유도결합 플라즈마kor
dc.subjectPolycrystalline silicon filmkor
dc.subject라만분광법kor
dc.subjectRaman spectroscopykor
dc.subject결정 분율kor
dc.subjectCrystalline fractionkor
dc.title유도결합 플라즈마 스퍼터링에 의해 제조된 저온 폴리실리콘 박막의 특성에 관한 연구kor
dc.title.alternativeStudy on the properties of the low temperature poly-silicon films fabricated by ICP assisted DC magnetron sputteringkor
dc.typeThesis-
dc.contributor.department재료공학부-
dc.description.degreeMasterkor
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