Browse
S-Space
College of Engineering/Engineering Practice School (공과대학/대학원)
Dept. of Materials Science and Engineering (재료공학부)
Theses (Master's Degree_재료공학부)
Gate oxide로 사용될 CVD-HfxAlyO 박막의 전기적 특성 개선
- Authors
- Advisor
- 김형준
- Issue Date
- 2004
- Publisher
- 서울대학교 대학원
- Keywords
- HfAlO ; Hfalo ; gate oxide ; Gate oxide ; CVD ; Cvd ; HRTEM ; Hrtem ; XPS ; Xps ; HF cleaning ; Hf cleaning
- Description
- 학위논문(석사)--서울대학교 대학원 :재료공학부,2004.
- Language
- Korean
- URI
- http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000055527
https://hdl.handle.net/10371/14338
- Files in This Item: There are no files associated with this item.
Items in S-Space are protected by copyright, with all rights reserved, unless otherwise indicated.