Publications
Detailed Information
ALD로 증착한 HfO₂ stack의 성장거동과 전기적 특성에 대한 연구
Cited 0 time in
Web of Science
Cited 0 time in Scopus
- Authors
- Advisor
- 황철성
- Issue Date
- 2003
- Publisher
- 서울대학교 대학원
- Keywords
- HfO2 ; Gate oxide ; ALD ; HRTEM ; XRD
- Description
- 학위논문(석사)--서울대학교 대학원 :재료공학부,2003.
- Language
- Korean
- URI
- http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000058285
https://hdl.handle.net/10371/14665
- Files in This Item:
- There are no files associated with this item.
Item View & Download Count
Items in S-Space are protected by copyright, with all rights reserved, unless otherwise indicated.