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단원자 증착법(ALD)으로 증착한 HfO₂박막의 구조적 전기적 특성 연구
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- Authors
- Advisor
- 황철성
- Issue Date
- 2006
- Publisher
- 서울대학교 대학원
- Keywords
- HfO2 ; SiN ; ALD ; crystallization ; SIMS
- Description
- 학위논문(석사)--서울대학교 대학원 :재료공학부,2006.
- Language
- Korean
- URI
- http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000047500
https://hdl.handle.net/10371/15003
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