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(The) microstructure and the properties of TaNx diffusion barrier deposited by inductively coupled plasma assisted sputtering
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- Authors
- Advisor
- 이정중
- Issue Date
- 2008
- Publisher
- 서울대학교 대학원
- Keywords
- 탄탈룸 나이트라이드 ; tantalum nitride (TaNx) ; 유도결합 플라즈마 ; inductively coupled plasma (ICP) ; 확산방지막 ; diffusion barrier ; 비정질 ; amorphous ; 미세구조 ; microstructure
- Description
- Thesis(masters) --서울대학교 대학원 :재료공학부,2008.2.
- Language
- English
- URI
- http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000041104
https://hdl.handle.net/10371/15022
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