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알루미늄 박막에서의 캐핑 층이 힐락 형성에 미치는 영향 평가 : Effect of capping layer on hillock formation in Al thin films

DC Field Value Language
dc.contributor.advisor주영창-
dc.contributor.author장광호-
dc.date.accessioned2009-11-25T03:15:50Z-
dc.date.available2009-11-25T03:15:50Z-
dc.date.copyright2007.-
dc.date.issued2007-
dc.identifier.urihttp://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000043719kor
dc.identifier.urihttps://hdl.handle.net/10371/15079-
dc.description학위논문(석사) --서울대학교 대학원 :재료공학부,2007.kor
dc.format.extent72 장kor
dc.language.isoko-
dc.publisher서울대학교 대학원kor
dc.subject힐락. 캐핑 층kor
dc.subjectAl filmkor
dc.subject알루미늄kor
dc.subjectHillockkor
dc.subject박막kor
dc.subjectCapping layerkor
dc.subjectThin filmkor
dc.title알루미늄 박막에서의 캐핑 층이 힐락 형성에 미치는 영향 평가kor
dc.title.alternativeEffect of capping layer on hillock formation in Al thin filmskor
dc.typeThesis-
dc.contributor.department재료공학부-
dc.description.degreeMasterkor
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