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Silicon nanowire growth on Si(111) by UHV-CVD : 초고진공 화학기상증착법을 이용한 (111) 기판 위 실리콘나노선 성장
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- Authors
- Advisor
- 윤의준
- Issue Date
- 2007
- Publisher
- 서울대학교 대학원
- Keywords
- 실리콘 ; Silicon (Si) ; 나노구조 ; nano structure ; 나노선 ; nanowire ; 급속열처리 ; rapid thermal annealing (RTA) ; 초고진공 화학기상증착법 ; ultra-high vacuum chemical vapor deposition (UHV-CVD) ; 타이타늄 ; titanium (Ti) ; 금속촉매 ; metal catalyst ; 기상-액상-고상 기구 ; vapor-liquild-solid (VLS) mechanism ; 타이타늄-실리콘-산소 삼원상태도 ; Ti-Si-O thenary phase diagram
- Description
- 학위논문(석사) --서울대학교 대학원 :재료공학부,2007.
- Language
- English
- URI
- http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000043724
https://hdl.handle.net/10371/15100
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