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A Study on the improvement of grain microstructure and device characteristics of polycrystalline silicon thin film transistor employing excimer laser annealing : 多結晶 실리콘 薄膜 素子의 그레인 微細 構造 및 特性 向上을 위한 엑시머 레이저 어닐링 方法에 關한 硏究

DC Field Value Language
dc.contributor.advisor한민구-
dc.contributor.author김천홍-
dc.date.accessioned2010-01-15T04:14:38Z-
dc.date.available2010-01-15T04:14:38Z-
dc.date.copyright2002.-
dc.date.issued2002-
dc.identifier.urihttp://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000061144eng
dc.identifier.urihttps://hdl.handle.net/10371/30710-
dc.descriptionThesis (doctoral)--서울대학교 대학원 :전기·컴퓨터공학부,2002.en
dc.format.extentxi, 130 leavesen
dc.language.isoenen
dc.publisher서울대학교 대학원en
dc.subjectpolycrystalline silicon thin film transistor (poly-Si TFT)en
dc.subject다결정 실리콘 박막 트랜지스터en
dc.subjectexcimer laser annealing (ELA)en
dc.subject엑시머 레이저 어닐링en
dc.subjectgrain microstructureen
dc.subject그레인 미세 구조en
dc.subjectfield effect mobilityen
dc.subject전계 효과 이동도en
dc.subjectlaser dopingen
dc.subject도핑en
dc.titleA Study on the improvement of grain microstructure and device characteristics of polycrystalline silicon thin film transistor employing excimer laser annealingen
dc.title.alternative多結晶 실리콘 薄膜 素子의 그레인 微細 構造 및 特性 向上을 위한 엑시머 레이저 어닐링 方法에 關한 硏究-
dc.typeThesis-
dc.contributor.department전기·컴퓨터공학부-
dc.description.degreeDoctoren
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