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Modeling and simulation of charging effects in electron beam lithography : 전자빔 리소그래피에서의 전하축적효과 모델링과 시뮬레이션

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dc.contributor.advisor전국진-
dc.contributor.author이용재-
dc.date.accessioned2010-01-15T04:18:13Z-
dc.date.available2010-01-15T04:18:13Z-
dc.date.copyright2001.-
dc.date.issued2001-
dc.identifier.urihttp://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000063421eng
dc.identifier.urihttps://hdl.handle.net/10371/30797-
dc.descriptionThesis (doctoral)--서울대학교 대학원 :전기.컴퓨터공학부,2001.en
dc.format.extentxi, 151 p.en
dc.language.isoenen
dc.publisher서울대학교 대학원en
dc.subjectSCALPELen
dc.subject전자빔리소그래피en
dc.subjectbeam deflectionen
dc.subject전하축적효과en
dc.subjectpattern distortionen
dc.subject몬테카를로 시뮬레이션en
dc.subjectnumerical methoden
dc.subject수치해석en
dc.subjectEBICen
dc.subject빔 굴절en
dc.titleModeling and simulation of charging effects in electron beam lithographyen
dc.title.alternative전자빔 리소그래피에서의 전하축적효과 모델링과 시뮬레이션-
dc.typeThesis-
dc.contributor.department전기.컴퓨터공학부-
dc.description.degreeDoctoren
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