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A study on the excimer laser annealing methods for large and uniform grain structure in polycrystalline silicon thin film transistor : 多結晶 실리콘 薄膜 트랜지스터의 그레인 크기 및 均一度를 向上시키기 위한 엑시머 레이저 어닐링 方法에 관한 硏究

DC Field Value Language
dc.contributor.advisor한민구-
dc.contributor.author전재홍-
dc.date.accessioned2010-01-15T04:18:23Z-
dc.date.available2010-01-15T04:18:23Z-
dc.date.copyright2001.-
dc.date.issued2001-
dc.identifier.urihttp://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000063413eng
dc.identifier.urihttps://hdl.handle.net/10371/30801-
dc.descriptionThesis (doctoral)--서울대학교 대학원 :전기.컴퓨터공학부,2001.en
dc.format.extentxii, 134 leavesen
dc.language.isoenen
dc.publisher서울대학교 대학원en
dc.subjectpolycrystalline silicon thin film transistoren
dc.subject다결정 실리콘 박막 트랜지스터en
dc.subjectexcimer laser annealingen
dc.subject엑시머 레이저 어닐링en
dc.subjectgrain structureen
dc.subject그레인 구조en
dc.subjectfield effect mobilityen
dc.subject전계 효과 이동도en
dc.subjectleakage currenten
dc.titleA study on the excimer laser annealing methods for large and uniform grain structure in polycrystalline silicon thin film transistoren
dc.title.alternative多結晶 실리콘 薄膜 트랜지스터의 그레인 크기 및 均一度를 向上시키기 위한 엑시머 레이저 어닐링 方法에 관한 硏究-
dc.typeThesis-
dc.contributor.department전기.컴퓨터공학부-
dc.description.degreeDoctoren
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