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Study on process dependence of contact resistance : 공정 조건에 따른 콘택 저항에 관한 연구

DC Field Value Language
dc.contributor.advisor이종덕-
dc.contributor.author허연철-
dc.date.accessioned2010-01-15T04:22:26Z-
dc.date.available2010-01-15T04:22:26Z-
dc.date.copyright2000.-
dc.date.issued2000-
dc.identifier.urihttp://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000069730eng
dc.identifier.urihttps://hdl.handle.net/10371/30903-
dc.descriptionThesis (doctoral)--서울대학교 대학원 :전기공학부,2000.en
dc.format.extentiv, 95 p.en
dc.language.isoenen
dc.publisher서울대학교 대학원en
dc.subject콘택 저항en
dc.subjectContact Resistanceen
dc.subject식각 선택비en
dc.subjectEtch Selectivityen
dc.subject복합 이온주입en
dc.subjectMixed Ion Implantationen
dc.subject콘택 플러그 이온주입en
dc.subjectContact Plug Ion Implantationen
dc.subject기판 손실량en
dc.subjectSubstrate Lossen
dc.titleStudy on process dependence of contact resistanceen
dc.title.alternative공정 조건에 따른 콘택 저항에 관한 연구-
dc.typeThesis-
dc.contributor.department전기공학부-
dc.description.degreeDoctoren
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