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Preamorphization implantation을 이용한 CoSi₂계면향상과 접합 누설전류 감소
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- Authors
- Advisor
- 박병국
- Issue Date
- 2001
- Publisher
- 서울대학교 대학원
- Keywords
- Ticapped CoSi₂ ; preamorphization implantation(PAI)
- Description
- 학위논문(석사)--서울대학교 대학원 :전기.컴퓨터공학부,2001.
- Language
- Korean
- URI
- http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000065194
https://hdl.handle.net/10371/31108
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