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화학증폭형 감광막의 거칠기 예측을 위한 분자단위 시뮬레이션
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- Authors
- Advisor
- 전국진
- Issue Date
- 2001
- Publisher
- 서울대학교 대학원
- Keywords
- Chemically amplified resists ; 화학증폭형 감광막 ; Resist roughness ; 감광막 거칠기 ; Molecular-scale lithography ; 분자단위 시뮬레이션
- Description
- 학위논문(석사)--서울대학교 대학원 :전기.컴퓨터공학부,2001.
- Language
- Korean
- URI
- http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000065179
https://hdl.handle.net/10371/31122
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