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광 리소그래피에서의 분해능과 초점심도 한계의 확장에 관한 연구와 물리교육에의 응용 : Study on extending the limits of resolution and depth of focus in optical lithography and its application to the physics education)
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- Authors
- Advisor
- 이성묵
- Issue Date
- 2002
- Publisher
- 서울대학교 대학원
- Keywords
- 광 리소그래피 ; optical lithography ; 초점심도 ; resolution ; 벡터 회절 ; depth of focus ; 타원 편광 조명 ; vector diffraction ; E-D Tree ; optical proximity correction(OPC)
- Description
- 학위논문(박사)--서울대학교 대학원 :과학교육과 물리전공,2002.
- Language
- Korean
- URI
- http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000060744
https://hdl.handle.net/10371/34168
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