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Homoepitaxial growth and in-situ doping of monocrystalline alpha-SiC thin films by MOCVD for power device applications

DC Field Value Language
dc.contributor.advisor김형준-
dc.contributor.author정재경-
dc.date.accessioned2010-01-17T02:12:29Z-
dc.date.available2010-01-17T02:12:29Z-
dc.date.copyright2002.-
dc.date.issued2002-
dc.identifier.urihttp://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000062871eng
dc.identifier.urihttps://hdl.handle.net/10371/35410-
dc.descriptionThesis (doctoral)--서울대학교 대학원 :재료공학부,2002.en
dc.format.extentxvii, 192 leavesen
dc.language.isoenen
dc.publisher서울대학교 대학원en
dc.subject6H-SiCen
dc.subject4H-SiCen
dc.subjectHomoepitaxial growthen
dc.subjectBTMSMen
dc.subjectPorous substrateen
dc.titleHomoepitaxial growth and in-situ doping of monocrystalline alpha-SiC thin films by MOCVD for power device applicationsen
dc.typeThesis-
dc.contributor.department재료공학부-
dc.description.degreeDoctoren
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