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Fatigue-free samarium-modified bismuth titanate film capacitors having large spontaneous polarizations

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dc.contributor.authorChon, Uong-
dc.contributor.authorKim, Ki-Bum-
dc.contributor.authorJang, Hyun M.-
dc.contributor.authorYi, Gyu-Chul-
dc.date.accessioned2009-06-23T03:40:33Z-
dc.date.available2009-06-23T03:40:33Z-
dc.date.issued2001-11-05-
dc.identifier.citationAppl. Phys. Lett. 79, 3137 (2001)en
dc.identifier.issn0003-6951 (print)-
dc.identifier.issn1077-3118 (online)-
dc.identifier.urihttps://hdl.handle.net/10371/4836-
dc.identifier.urihttp://link.aip.org/link/?APPLAB/79/3137/1-
dc.description.abstractFatigue-free and highly c-axis oriented Bi3.15Sm0.85Ti3O12 (BSmT) thin films were grown on Pt/TiO2/SiO2/Si(100) substrates using the method of metalorganic sol decomposition. The BSmT film capacitor with a top Pt electrode showed significantly improved values of the remanent polarization (2P(r)) and the nonvolatile charge as compared to those of the Bi4-xLaxTi3O12 (x=0.75) film capacitor, recently known as the most promising candidate for nonvolatile memories. The 2P(r) value of the BSmT capacitor was 49 muC/cm(2) at an applied voltage of 10 V while the net nonvolatile switching charge was as high as 20 muC/cm(2) and remained essentially constant up to 4.5x10(10) read/write switching cycles at a frequency of 1 MHz. In addition to these, the capacitor demonstrated excellent charge-retention characteristics with its sensing margin of 17 muC/cm(2) and a strong resistance against the imprinting failure. (C) 2001 American Institute of Physics.en
dc.language.isoenen
dc.publisherAmerican Institute of Physicsen
dc.subjectFERROELECTRIC CAPACITORSen
dc.subjectELECTRICAL-PROPERTIESen
dc.subjectTHIN-FILMSen
dc.subjectHETEROSTRUCTURESen
dc.subjectRETENTIONen
dc.subjectMEMORIESen
dc.titleFatigue-free samarium-modified bismuth titanate film capacitors having large spontaneous polarizationsen
dc.typeArticleen
dc.contributor.AlternativeAuthor이규철-
dc.contributor.AlternativeAuthor김기범-
dc.contributor.AlternativeAuthor전웅-
dc.identifier.doi10.1063/1.1415353-
dc.identifier.doi10.1063/1.1415353-
dc.citation.journaltitleApplied Physics Letters-
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