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플라즈마 화학 증착법에 의해 제조된 (Ti₁-xA1x)N 박막의 특성에 관한 연구 : Properties of the (Ti₁-xA1x)N coatings deposited by plasma enhanced chemical vapor deposition
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- Authors
- Advisor
- 이정중
- Issue Date
- 1998
- Publisher
- 서울대학교 대학원
- Keywords
- 플라즈마 화학기상증착 ; a(Ti,Al)N ; 플라즈마 전처리 ; plasma enhanced chemical vapor deposition(PECVD) ; 농도경사피막 ; plasma pre-treatment ; 접착력 ; compositionally gradient coating ; 피막산화특성 ; adhesion strength
- Description
- 학위논문(박사)--서울대학교 대학원 :금속공학과,1998.
- Language
- Korean
- URI
- http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000074773
https://hdl.handle.net/10371/50846
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