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저온 화학증착에 의해 제조된 TiN의 우선방위와 접착력
Preferred orientation and adhesion of titanium nitride films produced by low temperature chemical vapor deposition

DC Field Value Language
dc.contributor.advisor김상주-
dc.contributor.author민우식-
dc.date.accessioned2010-02-05T06:44:43Z-
dc.date.available2010-02-05T06:44:43Z-
dc.date.copyright1995.-
dc.date.issued1995-
dc.identifier.urihttp://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000085076kog
dc.identifier.urihttp://hdl.handle.net/10371/50879-
dc.description학위논문(박사)--서울대학교 대학원 :금속공학과,1995.ko
dc.format.extentx, 109 장ko
dc.language.isokoko
dc.publisher서울대학교 대학원ko
dc.subjectlow temperature chemical vapor depositionko
dc.subject저온화학증착ko
dc.subjecttitanium nitrideko
dc.subject티타늄 나이트라이드ko
dc.subjectpreferred orientationko
dc.subject우선방위ko
dc.subjectthe lowest energy planeko
dc.subject최소에너지면ko
dc.subjectcleavage planeko
dc.subject벽개면ko
dc.title저온 화학증착에 의해 제조된 TiN의 우선방위와 접착력ko
dc.title.alternativePreferred orientation and adhesion of titanium nitride films produced by low temperature chemical vapor depositionko
dc.typeThesis-
dc.contributor.department금속공학과-
dc.description.degreeDoctorko
Appears in Collections:
College of Engineering/Engineering Practice School (공과대학/대학원)Dept. of Material Science and Engineering (재료공학부) Theses (Ph.D. / Sc.D._재료공학부)
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