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AMOLED용 수소화 비정질 실리콘 박막 트랜지스터 문턱 전압 열화의 짧은 채널 효과 연구 : (A)Study on the short channel effect of threshold voltage degradation in hydrogenated amorphous silicon thin-film transistor for AMOLED

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dc.contributor.advisor한민구-
dc.contributor.author신광섭-
dc.date.accessioned2010-02-09T01:01:59Z-
dc.date.available2010-02-09T01:01:59Z-
dc.date.copyright2006.-
dc.date.issued2006-
dc.identifier.urihttp://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000049347kog
dc.identifier.urihttps://hdl.handle.net/10371/52579-
dc.description학위논문(석사) --서울대학교 대학원 :전기. 컴퓨터공학부,2006.ko
dc.format.extentiii, 86 장ko
dc.language.isokoko
dc.publisher서울대학교 대학원ko
dc.subject능동 행렬 유기 발광 다이오우드ko
dc.subjecta-Si:H TFTko
dc.subject수소화 비정질 실리콘ko
dc.subjectAMOLEDko
dc.subject박막 트랜지스터ko
dc.subjectthreshold voltageko
dc.subject문턱전압 열화ko
dc.subjectshort channelko
dc.subject짧은 채널ko
dc.titleAMOLED용 수소화 비정질 실리콘 박막 트랜지스터 문턱 전압 열화의 짧은 채널 효과 연구ko
dc.title.alternative(A)Study on the short channel effect of threshold voltage degradation in hydrogenated amorphous silicon thin-film transistor for AMOLEDko
dc.typeThesis-
dc.contributor.department전기. 컴퓨터공학부-
dc.description.degreeMasterko
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