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Sidewall 극미세 다중 패턴 형성 기술을 이용한 double-gate SOI finFETs의 제작 및 특성 연구
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- Authors
- Advisor
- 이종덕
- Issue Date
- 2006
- Publisher
- 서울대학교 대학원
- Keywords
- sidewall patterning 기술 ; sidewall patterning technique ; 극미세 다중 패턴 ; very fine multi-line ; double-gate ; double-gate ; SOI ; SOI ; FinFET ; FinFET
- Description
- 학위논문(석사)--서울대학교 대학원 :전기공학부,2006.
- Language
- Korean
- URI
- http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000047763
https://hdl.handle.net/10371/53483
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