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Metal-organic vapor phase epitaxial growth of high-quality ZnO on Al2O3(00.1)
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Park, W.I. | - |
dc.contributor.author | An, S-J. | - |
dc.contributor.author | Yi, Gyu-Chul | - |
dc.contributor.author | Jang, Hyun M. | - |
dc.date.accessioned | 2009-07-12T23:50:54Z | - |
dc.date.available | 2009-07-12T23:50:54Z | - |
dc.date.issued | 2001-05-01 | - |
dc.identifier.citation | J. Mater. Res., 16, 1358 (2001) | en |
dc.identifier.issn | 0884-2914 | - |
dc.identifier.uri | http://www.mrs.org | - |
dc.identifier.uri | https://hdl.handle.net/10371/5353 | - |
dc.description.abstract | High-quality ZnO thin films were grown epitaxially at 250-550 degreesC Al2O3(00.1) substrates using low-pressure metalorganic vapor phase epitaxy. The reactants for the growth were diethylzinc and oxygen. Growth temperature, one of the important experimental parameters for epitaxial layers, was optimized. The films grown at 500 degreesC exhibited good crystallinity and strong ultraviolet absorption and emission. Photoluminescence spectra of the films showed a dominant excitonic emission with a weak deep level emission. More importantly, a strong stimulated emission peak was observed even at room temperature. | en |
dc.description.sponsorship | This research was sponsored by POSTECH BSRI Special Fund-2000, the Brain Korea 21 project, and the KISTEP through the National Research Laboratory program. | en |
dc.language.iso | en | - |
dc.publisher | Materials Research Society | en |
dc.title | Metal-organic vapor phase epitaxial growth of high-quality ZnO on Al2O3(00.1) | en |
dc.type | Article | en |
dc.contributor.AlternativeAuthor | 이규철 | - |
dc.identifier.doi | 10.1557/JMR.2001.0190 | - |
dc.identifier.doi | 10.1557/JMR.2001.0190 | - |
dc.citation.journaltitle | Journal of Materials Research | - |
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