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Dependence of carbon incorporation rate on crystallographic orientation of GaAs grown by MOCVD using CCI4 : MOCVV장치로 기른 GaAs를 CCI4로 도핑시켰을 때의 탄소도핑효율의 기판결정방향에 대한 의존성

DC Field Value Language
dc.contributor.advisor최병두-
dc.contributor.author이병양-
dc.date.accessioned2010-02-22-
dc.date.available2010-02-22-
dc.date.copyright1996.-
dc.date.issued1996-
dc.identifier.urihttp://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000081931eng
dc.identifier.urihttps://hdl.handle.net/10371/56163-
dc.descriptionThesis (master`s)--서울대학교 대학원 :물리학과,1996.en
dc.format.extent33 p.en
dc.language.isoenen
dc.publisher서울대학교 대학원en
dc.titleDependence of carbon incorporation rate on crystallographic orientation of GaAs grown by MOCVD using CCI4en
dc.title.alternativeMOCVV장치로 기른 GaAs를 CCI4로 도핑시켰을 때의 탄소도핑효율의 기판결정방향에 대한 의존성-
dc.typeThesis-
dc.contributor.department물리학과-
dc.description.degreeMasteren
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