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Generalization of the Use of Random Copolymers To Control the Wetting Behavior of Block Copolymer Films

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Authors
Ji, Shengxiang; Liu, Chi-Chun; Son, Jeong Gon; Gotrik, Kevin; Craig, Gordon S. W.; Gopalan, Padma; Himpsel, F. J.; Char, Kookheon; Nealey, Paul F.
Issue Date
2008-11-11
Publisher
American Chemical Society
Citation
Macromolecules, 2008, 41, 9098-9103
Abstract
Random copolymer brushes of poly(styrene-r-methyl methacrylate) (PS-r-PMMA) have previously been used to control the wetting behavior of poly(styrene-b-methyl methacrylate) (PS-b-PMMA) block copolymer. Here we demonstrate that the use of random copolymer may be generalized to other block copolymer systems. A series of poly(styrene-r-2-vinylpyridine-r-hydroxyethyl methacrylate) (PS-r-P2VP-r-PHEMA) random copolymers was synthesized and evaluated as brush layers to control the orientation of domains in thin films of poly(styrene-b-2-vinylpyridine) (PS-b-P2VP) block copolymer. On nonpreferential brushes, thin films of PS-b-P2VP had a mixed orientation of domains consisting of a perpendicular orientation of lamellar domains near the copolymer−substrate interface and a parallel orientation of lamellar domains at free surface because of the lower surface energy of the PS block. The composition window of brushes that induce vertical orientation of domains near the substrate ranges from 47.8% styrene to 57.0% styrene, as determined by SEM and GISAXS measurements of films after removal of the parallel-oriented domains at surfaces (remaining film thickness ≈ 50 nm). When the PS-b-P2VP film was confined between two brushes having compositions within the above range, perpendicular-oriented lamellae that traversed the film thickness were obtained.
ISSN
0024-9297 (print)
1520-5835 (online)
Language
English
URI
http://hdl.handle.net/10371/5697
DOI
https://doi.org/10.1021/ma801861h

https://doi.org/10.1021/ma801861h
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College of Engineering/Engineering Practice School (공과대학/대학원)Dept. of Chemical and Biological Engineering (화학생물공학부)Journal Papers (저널논문_화학생물공학부)
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