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Effect of UV Pretreatment on the Nanopore Formation within Organosilicate Thin Films

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dc.contributor.authorKim, Suhan-
dc.contributor.authorLyu, Yi-Yeol-
dc.contributor.authorHahn, Junhee-
dc.contributor.authorChar, Kookheon-
dc.date.accessioned2009-07-20T06:39:43Z-
dc.date.available2009-07-20T06:39:43Z-
dc.date.issued2007-05-31-
dc.identifier.citationJ. Electrochem. Soc., 154, G171 (2007)en
dc.identifier.issn0013-4651-
dc.identifier.urihttp://hdl.handle.net/10371/5769-
dc.description.abstractWe have investigated the low-temperature cure process to realize nanoporous organosilicate thin films at temperature below 150°C
by adding a small amount of photoacid generator PAG followed by UV irradiation. The Gemini surfactant, which decomposes
in the temperature range from 170 to 420°C, was used as a pore-generating material porogen for organosilicate matrix. The UV
pretreatment in the presence of PAG lowers the condensation temperature of poly methyl silsesquioxane matrix and leads to the
fast matrix vitrification enabling the addition of increased amount of porogens. Because the full vitrification of the matrix 150°C
by UV pretreatment in the presence of PAG below the decomposition temperature of porogens 170°C prevents the pore collapse,
the porosity up to 35.5% was achieved with an average pore size of 3.4 nm, as measured from X-ray reflectivity as well as
ellipsometric porosimetry. It is shown that both dielectric constant and refractive index continue to decrease to 2.0 and 1.26,
respectively. The present experimental system demonstrates that porogens with low degradation temperature can be successfully
incorporated to realize nanoporous films without pore collapse. Consequently, this process can widen the choice of porogens to
prepare nanoporous films.
en
dc.description.sponsorshipThis work was supported by the NANO Systems Institute-National Core Research Center (NSI-NCRC) of the Korea Science and Engineering Foundation KOSEF , the Brain Korea 21 Program endorsed by the Ministry of Education of Korea, and “System IC 2010” Project of Korea Ministry of Commerce, Industry and Energy.en
dc.language.isoen-
dc.publisherElectrochemical Societyen
dc.titleEffect of UV Pretreatment on the Nanopore Formation within Organosilicate Thin Filmsen
dc.typeArticleen
dc.contributor.AlternativeAuthor김수한-
dc.contributor.AlternativeAuthor류이열-
dc.contributor.AlternativeAuthor한준희-
dc.contributor.AlternativeAuthor차국헌-
dc.identifier.doi10.1149/1.2741181-
Appears in Collections:
College of Engineering/Engineering Practice School (공과대학/대학원)Dept. of Chemical and Biological Engineering (화학생물공학부)Journal Papers (저널논문_화학생물공학부)
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