Publications

Detailed Information

Compensation effect in the rate of solid-phase epitaxial growth of Si1-xGex alloys

DC Field Value Language
dc.contributor.authorSuh, K. Y.-
dc.contributor.authorLee, Hong H.-
dc.date.accessioned2009-08-06T05:06:43Z-
dc.date.available2009-08-06T05:06:43Z-
dc.date.issued1997-05-15-
dc.identifier.citationJ. Appl. Phys. 81, 7067 (1997)en
dc.identifier.issn0021-8979-
dc.identifier.urihttps://hdl.handle.net/10371/6246-
dc.description.abstractThe compensation effect, well known in catalytic reactions, is shown to apply equally well to the solid-phase epitaxial (SPE) growth of Si1-xGex alloys. A linear relationship exists between the logarithm of the pre-exponential factor and the activation energy of the SPE growth rate. This linear relationship, together with the activation energy obtained earlier, enables one to completely describe the growth rate of Si1-xGex alloys. The effect holds for both strained and unstrained SPE. The model is applicable to other binary alloys.en
dc.language.isoenen
dc.publisherAmerican Institute of Physicsen
dc.subjectKINETICSen
dc.titleCompensation effect in the rate of solid-phase epitaxial growth of Si1-xGex alloysen
dc.typeArticleen
dc.contributor.AlternativeAuthor서갑양-
dc.contributor.AlternativeAuthor이홍희-
Appears in Collections:
Files in This Item:

Altmetrics

Item View & Download Count

  • mendeley

Items in S-Space are protected by copyright, with all rights reserved, unless otherwise indicated.

Share