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Fabrication of elastomeric stamps with polymer-reinforced sidewalls via chemically selective vapor deposition polymerization of poly(p-xylylene)

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Authors
Suh, Kahp Y.; Langer, Robert; Lahann, Jorg
Issue Date
2003-11-17
Publisher
American Institute of Physics
Citation
Appl. Phys. Lett. 83, 4250 (2003)
Keywords
SOFT LITHOGRAPHYRESOLUTIONSTABILITYFILMS
Abstract
We report on the preparation of polydimethylsiloxane stamps with selectively grown polymer sidewalls by chemical vapor deposition polymerization of poly(p-xylylene). Using a thin iron layer as an inhibitor, the deposition occurs only on the sidewalls of the features in relief, resulting in a polymer-reinforced stamp. The wetting properties of stamps can be restored after removing the thin iron layer with an acidic solution, which has been verified by pattern transfer to an underlying substrate using molding and microcontact printing.
ISSN
0003-6951
Language
English
URI
http://hdl.handle.net/10371/6270
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College of Engineering/Engineering Practice School (공과대학/대학원)Dept. of Mechanical Aerospace Engineering (기계항공공학부)Journal Papers (저널논문_기계항공공학부)
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