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Capillary force lithography: Large-area patterning, self-organization, and anisotropic dewetting

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Authors
Suh, K. Y.; Lee, Hong H.
Issue Date
2002-06
Publisher
John Wiley & Sons
Citation
Adv. Funct. Mater. 2002, 12, 405
Keywords
THIN POLYMER-FILMSTEMPERATURE IMPRINT LITHOGRAPHYASSEMBLED MONOLAYERSSURFACESMICROSTRUCTURESAnisotropic dewettingLithography capillary forcePatterning 3DPoly(dimethylsiloxanes) (PDMS)
Abstract
This article gives an overview on a new lithographic technique called capillary force lithography for large-area patterning. The technique simply involves placing a polydimethylsiloxane model on a polymer film, which is then heated above the glass-transition temperature of the polymer. Various useful microstructures can be obtained by sequential applications of the technique through self-organization. Dewetting, which can be observed in capillary force lithography for relatively thin films, is also described as a new pathway for realizing anisotropic dewetting.
ISSN
1616-301X
Language
English
URI
http://hdl.handle.net/10371/6273
DOI
https://doi.org/10.1002/1616-3028(20020618)12:6/7<405::AID-ADFM405>3.0.CO;2-1
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College of Engineering/Engineering Practice School (공과대학/대학원)Dept. of Mechanical Aerospace Engineering (기계항공공학부)Journal Papers (저널논문_기계항공공학부)
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