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Capillary force lithography: Large-area patterning, self-organization, and anisotropic dewetting
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- Authors
- Issue Date
- 2002-06
- Publisher
- John Wiley & Sons
- Citation
- Adv. Funct. Mater. 2002, 12, 405
- Keywords
- THIN POLYMER-FILMS ; TEMPERATURE IMPRINT LITHOGRAPHY ; ASSEMBLED MONOLAYERS ; SURFACES ; MICROSTRUCTURES ; Anisotropic dewetting ; Lithography capillary force ; Patterning 3D ; Poly(dimethylsiloxanes) (PDMS)
- Abstract
- This article gives an overview on a new lithographic technique called capillary force lithography for large-area patterning. The technique simply involves placing a polydimethylsiloxane model on a polymer film, which is then heated above the glass-transition temperature of the polymer. Various useful microstructures can be obtained by sequential applications of the technique through self-organization. Dewetting, which can be observed in capillary force lithography for relatively thin films, is also described as a new pathway for realizing anisotropic dewetting.
- ISSN
- 1616-301X
- Language
- English
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