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Optimized Surface Treatment of Indium Tin Oxide (ITO) for Copper Electroless Plating

Cited 11 time in Web of Science Cited 10 time in Scopus
Authors

Kim, Jae Jeong; Cha, Seung Hwan

Issue Date
2002-11
Publisher
Japan Society of Applied Physics
Citation
Japanese Journal of Applied Physics 41 (2002) L1269-L1271
Keywords
ITOcopperelectrolesspalladiumtinactivation
Abstract
Electrolessly plated Cu film on indium tin oxide (ITO) substrate was studied for the application of the data bus line in large scale liquid crystal display (LCD) and plasma display panel (PDP). The optimized surface treatment of ITO substrate was extensively investigated. The two-step pretreatment of Sn sensitization and Pd activation resulted in the best results. Using the optimized treatment, the electrolessly plated Cu film with (100) and (200) preferred orientation showed 7 nm root mean square (RMS) roughness, as-deposited 2.2 µΩ·cm resistivity, good adhesion and excellent selectivity.
ISSN
0021-4922
Language
English
URI
https://hdl.handle.net/10371/63266
DOI
https://doi.org/10.1143/JJAP.41.L1269
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