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Surface Roughness Reducing Effect of Iodine Sources (CH3I, C2H5I) on Ru and RuO2 Composite Films Grown by MOCVD
Cited 30 time in
Web of Science
Cited 31 time in Scopus
- Authors
- Issue Date
- 2002-04
- Publisher
- Elsevier
- Citation
- Thin Solid Films 409 (2002) 28-32
- Keywords
- Chemical vapor deposition ; Surface roughness ; Ruthenium
- ISSN
- 0040-6090
- Language
- English
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