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Surface Roughness Reducing Effect of Iodine Sources (CH3I, C2H5I) on Ru and RuO2 Composite Films Grown by MOCVD

Cited 29 time in Web of Science Cited 30 time in Scopus
Authors
Kim, Jae Jeong; Jung, Doo Hwan; Kim, Moon Soo; Kim, Sang Hyun; Yoon, Do Young
Issue Date
2002-04
Publisher
Elsevier
Citation
Thin Solid Films 409 (2002) 28-32
Keywords
Chemical vapor depositionSurface roughnessRuthenium
ISSN
0040-6090
Language
English
URI
http://hdl.handle.net/10371/63267
DOI
https://doi.org/10.1016/S0040-6090(02)00098-6
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College of Engineering/Engineering Practice School (공과대학/대학원)Dept. of Chemical and Biological Engineering (화학생물공학부)Journal Papers (저널논문_화학생물공학부)
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