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Surface Roughness Reducing Effect of Iodine Sources (CH3I, C2H5I) on Ru and RuO2 Composite Films Grown by MOCVD
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kim, Jae Jeong | - |
| dc.contributor.author | Jung, Doo Hwan | - |
| dc.contributor.author | Kim, Moon Soo | - |
| dc.contributor.author | Kim, Sang Hyun | - |
| dc.contributor.author | Yoon, Do Young | - |
| dc.date.accessioned | 2010-04-15T07:45:32Z | - |
| dc.date.available | 2010-04-15T07:45:32Z | - |
| dc.date.issued | 2002-04 | - |
| dc.identifier.citation | Thin Solid Films 409 (2002) 28-32 | en |
| dc.identifier.issn | 0040-6090 | - |
| dc.identifier.uri | https://hdl.handle.net/10371/63267 | - |
| dc.language.iso | en | en |
| dc.publisher | Elsevier | en |
| dc.subject | Chemical vapor deposition | en |
| dc.subject | Surface roughness | en |
| dc.subject | Ruthenium | en |
| dc.title | Surface Roughness Reducing Effect of Iodine Sources (CH3I, C2H5I) on Ru and RuO2 Composite Films Grown by MOCVD | en |
| dc.type | Article | en |
| dc.contributor.AlternativeAuthor | 김재정 | - |
| dc.contributor.AlternativeAuthor | 정두환 | - |
| dc.contributor.AlternativeAuthor | 김문수 | - |
| dc.contributor.AlternativeAuthor | 김상현 | - |
| dc.contributor.AlternativeAuthor | 윤두영 | - |
| dc.identifier.doi | 10.1016/S0040-6090(02)00098-6 | - |
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