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열 필라멘트에 의한 결정성 실리콘 나이트라이드 저온 증착 : Deposition of Crystalline Silicon Nitride at Low Temperature by Hot-Wire Chemical Vapor Deposition
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- Authors
- Advisor
- 황농문
- Issue Date
- 2010
- Publisher
- 서울대학교 대학원
- Keywords
- 열 필라멘트 화학 기상 증착 ; HWCVD (Hot Wire Chemical Vapor Deposition) ; 결정질 α-실리콘 나이트라이드 ; crystalline a-Si3N4 nanoparticles ; 나노입자 ; precipitation temperature ; 석출온도 ; substrate temperature ; 압력 ; reactor pressure ; 기판온도
- Description
- 학위논문(석사) --서울대학교 대학원 :재료공학부,2010.2.
- Language
- Korean
- URI
- http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000033285
https://hdl.handle.net/10371/64809
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