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Metal surface oxidation by using dielectric barrier discharge

Cited 7 time in Web of Science Cited 7 time in Scopus
Authors
Kim, Hyun-Su; Kang, Woo Seok; Hong, Sang Hee
Issue Date
2010-09-01
Publisher
Elsevier
Citation
Thin Solid Films 518 (2010) 6394-6398
Keywords
dielectric barrier dischargeplasma treatmentmetal surface oxidationhydrophilic surfaceatomic oxygen
Abstract
The surface oxidation of metal is investigated through plasma treatments with an atmospheric-pressure dielectric barrier discharge (DBD) for comparison with a conventional thermal oxidation process. After the plasma treatment of a copper plate, the Cu surface was noted to have abundant CuO and Cu(OH)2 which act the part of hydrophilic functional elements. Highly improved wettability was also noted. When a greater amount of atomic oxygen is generated in the plasma by the DBD at a high applied voltage and a high O2 additive concentration, the hydrophilic functional elements become more abundant and therefore enhance the wettability of the oxidized surface.
ISSN
0040-6090
Language
English
URI
http://hdl.handle.net/10371/69362
DOI
https://doi.org/10.1016/j.tsf.2010.03.142
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College of Engineering/Engineering Practice School (공과대학/대학원)Dept. of Energy Systems Engineering (에너지시스템공학부)Nuclear Engineering (원자핵공학전공)Journal Papers (저널논문_원자핵공학과)
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