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Metal surface oxidation by using dielectric barrier discharge

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dc.contributor.authorKim, Hyun-Su-
dc.contributor.authorKang, Woo Seok-
dc.contributor.authorHong, Sang Hee-
dc.date.accessioned2010-08-26T22:29:30Z-
dc.date.available2010-08-26T22:29:30Z-
dc.date.issued2010-09-01-
dc.identifier.citationThin Solid Films 518 (2010) 6394-6398en
dc.identifier.issn0040-6090-
dc.identifier.urihttps://hdl.handle.net/10371/69362-
dc.description.abstractThe surface oxidation of metal is investigated through plasma treatments with an atmospheric-pressure dielectric barrier discharge (DBD) for comparison with a conventional thermal oxidation process. After the plasma treatment of a copper plate, the Cu surface was noted to have abundant CuO and Cu(OH)2 which act the part of hydrophilic functional elements. Highly improved wettability was also noted. When a greater amount of atomic oxygen is generated in the plasma by the DBD at a high applied voltage and a high O2 additive concentration, the hydrophilic functional elements become more abundant and therefore enhance the wettability of the oxidized surface.en
dc.description.sponsorshipPartially supported by the Nuclear R & D Project and the Brain Korea 21 Program funded from the Korea National Research Foundationen
dc.language.isoenen
dc.publisherElsevieren
dc.subjectdielectric barrier dischargeen
dc.subjectplasma treatmenten
dc.subjectmetal surface oxidationen
dc.subjecthydrophilic surfaceen
dc.subjectatomic oxygenen
dc.titleMetal surface oxidation by using dielectric barrier dischargeen
dc.typeArticleen
dc.contributor.AlternativeAuthor김현수-
dc.contributor.AlternativeAuthor강우석-
dc.contributor.AlternativeAuthor홍상희-
dc.identifier.doi10.1016/j.tsf.2010.03.142-
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