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Metal surface oxidation by using dielectric barrier discharge
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, Hyun-Su | - |
dc.contributor.author | Kang, Woo Seok | - |
dc.contributor.author | Hong, Sang Hee | - |
dc.date.accessioned | 2010-08-26T22:29:30Z | - |
dc.date.available | 2010-08-26T22:29:30Z | - |
dc.date.issued | 2010-09-01 | - |
dc.identifier.citation | Thin Solid Films 518 (2010) 6394-6398 | en |
dc.identifier.issn | 0040-6090 | - |
dc.identifier.uri | https://hdl.handle.net/10371/69362 | - |
dc.description.abstract | The surface oxidation of metal is investigated through plasma treatments with an atmospheric-pressure dielectric barrier discharge (DBD) for comparison with a conventional thermal oxidation process. After the plasma treatment of a copper plate, the Cu surface was noted to have abundant CuO and Cu(OH)2 which act the part of hydrophilic functional elements. Highly improved wettability was also noted. When a greater amount of atomic oxygen is generated in the plasma by the DBD at a high applied voltage and a high O2 additive concentration, the hydrophilic functional elements become more abundant and therefore enhance the wettability of the oxidized surface. | en |
dc.description.sponsorship | Partially supported by the Nuclear R & D Project and the Brain Korea 21 Program funded from the Korea National Research Foundation | en |
dc.language.iso | en | en |
dc.publisher | Elsevier | en |
dc.subject | dielectric barrier discharge | en |
dc.subject | plasma treatment | en |
dc.subject | metal surface oxidation | en |
dc.subject | hydrophilic surface | en |
dc.subject | atomic oxygen | en |
dc.title | Metal surface oxidation by using dielectric barrier discharge | en |
dc.type | Article | en |
dc.contributor.AlternativeAuthor | 김현수 | - |
dc.contributor.AlternativeAuthor | 강우석 | - |
dc.contributor.AlternativeAuthor | 홍상희 | - |
dc.identifier.doi | 10.1016/j.tsf.2010.03.142 | - |
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