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Fabrication of multimode polymeric waveguides and micromirrors using deep x-ray lithography

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Authors
Kim, Joon-Sung; Kim, Jang-Joo
Issue Date
2004-03
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Citation
IEEE Photon. Technol. Lett., vol. 16, pp. 798-800, Mar. 2004
Keywords
X-ray lithographyelastomersmicromirrorsoptical fabricationoptical interconnectionsoptical lossesoptical polymersoptical waveguidespolymeric multimode waveguide
Abstract
Multimode polymeric waveguides and 45° micromirrors have been fabricated using deep X-ray lithography. Polymethylmetacrylate was used as a core layer and silica and silicone elastomer as a lower and upper cladding layer, respectively. The propagation loss of the waveguide was 0.54 dB/cm at 830 nm and the loss of micromirrors was less than 0.43 dB at the wavelength. The X-ray lithography technique offers the controllability of mirror angles to 45° and -45° so that it gives flexibility to the system architecture of optical interconnections.
ISSN
1041-1135
Language
English
URI
http://hdl.handle.net/10371/7080
DOI
https://doi.org/10.1109/LPT.2004.823694
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College of Engineering/Engineering Practice School (공과대학/대학원)Dept. of Material Science and Engineering (재료공학부) Journal Papers (저널논문_재료공학부)
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