SHERP

A Micromachined Silicon Depth Probe for Multichannel Neural Recording

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Authors
Yoon, Tae Hwan; Hwang, Eun Jung; Shin, Dong Yong; Park, Se Ik; Oh, Seung Jae; Jung, Sung Cherl; Shin, Hyung Cheul; Kim, Sung June
Issue Date
2000-08
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Citation
IEEE Trans. Biomed. Eng., vol. 47, pp. 1082-1087, Aug. 2000
Keywords
Mechanical stress testmultichannel simultaneous recordingneural probesplasma etchsilicon microelectrode array
Abstract
Aprocess of making a new type of silicon depth-probe
microelectrode array is described using a combination of plasma
and wet etch. The plasma etch, which is done using a low temperature
oxide (LTO) mask, enables probe thickness to be controlled
over a range from 5 to 90 . Bending tests show that the probe’s
mechanical strength depends largely on shank thickness. More
force can be applied to thicker shanks while thinner shanks are
more flexible. One can then choose a thickness and corresponding
mechanical strength using the process developed. The entire
probe shaping process is performed only at low temperature,
and thus is consistent with the standard CMOS fabrication.
Using the probe in recording from rat’s somatosensory cortex,
we obtained four channel simultaneous recordings which showed
clear independence among channels with a signal-to-noise ratio
performance comparable with that obtained using other devices.
ISSN
0018-9294
Language
English
URI
http://hdl.handle.net/10371/8867
DOI
https://doi.org/10.1109/10.855936
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College of Engineering/Engineering Practice School (공과대학/대학원)Dept. of Electrical and Computer Engineering (전기·정보공학부)Journal Papers (저널논문_전기·정보공학부)
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