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A Simultaneous Multichannel Recording Obtained from Rat Cortex Using a Plasma Etched Silicon Depth Probe

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Authors
Hwang, E.; Kim, Sung June; Yoon, T.; Shin, D.; Oh, S.; Jung, S.; Shin, H.
Issue Date
1999-10
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Citation
1999 BMES -IEEE EMBS Joint Conference, vol. 1, p. 380, Atlanta, USA, Oct. 1999
Keywords
silicon microelectrode arrayneural probesplasma etchmulti-channel electrode
Abstract
Combination of plasma and wet etching was done in developing a new silicon depth-probe type microelectrode array. The plasma etch uses low temperature oxide (LTO) mask instead of thick photoresist mask, and enables the thickness of the probe shank to be defined more freely and in wider range. The entire probe shaping process was performed only at low temperature, and is CMOS compatible. A probe with 30 μm shank thickness was successfully used in recording from rat's somatosensory cortex. A four-channel simultaneous neural recording shows signal-to-noise ratio performance comparable with that obtained using conventional microprobes.
Language
English
URI
http://hdl.handle.net/10371/8906
DOI
https://doi.org/10.1109/IEMBS.1999.802457
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College of Engineering/Engineering Practice School (공과대학/대학원)Dept. of Electrical and Computer Engineering (전기·정보공학부)Others_전기·정보공학부
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