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On the role of surface tensions and process conditions in detachment nanolithography

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Authors
Kim, Jae Kwan; Suh, Kahp Y.
Issue Date
2008-06-02
Publisher
American Institute of Physics
Citation
Appl. Phys. Lett. 92, 223107 (2008)
Keywords
LITHOGRAPHYSTAMPSOFT
Abstract
We report on the role of intrinsic (adhesion force and wettability) and extrinsic (temperature and pressure) conditions to fabricate dense nanoscale patterns in detachment nanolithography. A phase diagram is constructed by using a rigiflex polymeric mold, an organic film, and silicon or gold substrate. Operating conditions in terms of surface tensions and processing parameters are discussed along with comparison of the minimum resolution with a simple theory.
ISSN
0003-6951
Language
English
URI
http://hdl.handle.net/10371/8974
DOI
https://doi.org/10.1063/1.2937143
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College of Engineering/Engineering Practice School (공과대학/대학원)Dept. of Mechanical Aerospace Engineering (기계항공공학부)Journal Papers (저널논문_기계항공공학부)
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