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Room Temperature Detachment Nanolithography Using a Rigiflex Polymeric Mold

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Authors
Kim, Jae Kwan; Suh, Kahp Y.
Issue Date
2008-07
Publisher
American Scientific Publishers
Citation
J. Nanosci. Nanotechnol. 8, 3621 (2008)
Keywords
NanolithographyDetachmentMoldRoom TemperatureLIGHT-EMITTING-DIODESNANOIMPRINT LITHOGRAPHYSOFT LITHOGRAPHYFABRICATIONNANOSCALE
Abstract
We report on detachment nanolithography of an organic thin film at room temperature mediated by ultraviolet (UV) exposure. A nanopatterned, UV curable polyurethane acrylate (PUA) mold was placed on a spin-coated organic film made of 4,4'-bis[N-1-napthyl-N-phenyl-amino]biphenyl (NPB) under a low pressure (1-2 bar). A higher work of adhesion at the organic/mold interface induced detachment of the contacting layer on silicon or gold substrate, resulting in well-defined nanopatterns without a residual layer. The detachment was highly improved by a short-term UV exposure, rendering the film surface free from contaminant hydrocarbons with a lower cohesive force, as confirmed by Fourier transform infrared (FTIR) spectroscopy and measurements of contact angle of water.
ISSN
1533-4880
Language
English
URI
http://hdl.handle.net/10371/9622
DOI
https://doi.org/10.1166/jnn.2008.162
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College of Engineering/Engineering Practice School (공과대학/대학원)Dept. of Mechanical Aerospace Engineering (기계항공공학부)Journal Papers (저널논문_기계항공공학부)
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