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3-Dimensional NAND flash memory having Tied Bit-line and Ground Select Transistor (TiGer) : 비트라인과 그라운드 선택 트랜지스터가 연결된 구조를 가지는 3차원 낸드 플래시 메모리

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dc.contributor.advisor박병국-
dc.contributor.author박세환-
dc.date.accessioned2017-07-13T07:06:30Z-
dc.date.available2017-07-13T07:06:30Z-
dc.date.issued2014-08-
dc.identifier.other000000021979-
dc.identifier.urihttps://hdl.handle.net/10371/119042-
dc.description학위논문 (박사)-- 서울대학교 대학원 : 전기·컴퓨터공학부, 2014. 8. 박병국.-
dc.description.abstractThe demand for flash memory in mobile devices such as smart phone and pads, and digital cameras, portable music players is constantly increasing. Moreover, many hard disk drives in desktop computer are replaced by the solid state drives. This trend accelerates the scaling down of NAND flash memory. As NAND flash memory is scaled down, short channel effect and reliability problems become more severe and further scaling down is faced with process limitations.
To overcome these problems, 3-D stacked NAND flash memory has been introduced for ultra-high-density storage device. Among the proposed structures, channel stacked array has most outstanding electrical characteristic, but has several drawbacks related with decoding difficulty, and additional process steps.
In this dissertation, Channel STacked ARray (CSTAR) having Tied bit-line and Ground Select Transistor (TiGer) structure is proposed and investigated to solve problems of conventional channel stacked array. In case of CSTAR having TiGer, the stacked layers can be distinguished by addressing of common source line (CSL) and bit-line (BL) only. Since ground select transistors (GSTs) are tied with BLs, there are no ground select line (GSL) and GSL decoder. This is main feature of TiGer structure. To execute memory operations successfully, novel program operation scheme for TiGer structure is introduced because the GST of TiGer structure can be handled independently unlike conventional NAND flash memory. To verify the proposed operation scheme, TCAD simulation is performed.
To fabricate the stacked array, process flow and several unit processes are investigated, and finally 4-stacked single crystalline Si nanowire with GAA structure is fabricated. Si/SiGe epitaxial growth, isotropic SiGe selective etching, stacked nanowire formation, and damascene gate formation are demonstrated, and memory operation for TiGer structure is verified by fabricated device.
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dc.description.tableofcontentsAbstract i
Contents iii
Chapter 1
Introduction 1
1.1 Flash Memory Technology 1
1.2 Flash Memory Unit Cell and Array Structure 7
1.3 Basic Operation of NAND flash memory 13
1.3.1 Program and Erase Operation 13
1.3.1 Read Operation 16
1.4 Charge Trap Flash Memory 20
Chapter 2
3-D Stacked NAND Flash Memory 22
2.1 Introduction to 3-D Stacked NAND Flash Memory 22
2.2 Gate Stack Type NAND Flash Memory 26
2.3 Channel Stack Type NAND Flash Memory 33
2.4 Comparison between Gate Stack Type NAND Flash and Channel Stack Type NAND Flash 39
Chapter 3
Channel STacked ARray (CSTAR) having Tied bit-line and Ground Select Transistor (TiGer) 42
3.1 3-D NAND Flash Memory Architecture Design of Channel STacked ARray having Tied Bit-line and Ground Select Transistor 42
3.2 Operation Scheme of Channel Stacked ARray having TiGer structure 45
3.2.1 Erase operation of CSTAR having TiGer structure 46
3.2.2 Program Operation of CSTAR having TiGer structure 50
3.2.3 Read Operation of CSTAR having TiGer structure 56
3.2.4 Full Array Design Based on CSTAR having TiGer structure 59
Chapter 4
Fabrication and Measurement Results of CSTAR having TiGer structure 61
4.1 Fabrication Process of CSTAR having TiGer structure 61
4.2 Key Process Issues of CSTAR fabrication 68
4.2.1 SiGe/Si Epitaxial Growth for Single-crystalline Si Channel 68
4.2.2 SiGe Selective Isotropic Etching 69
4.2.2.1 Chemical Dry Etching in Fluorocarbon Plasma 69
4.2.2.2 Ammonia-Peroxide Mixture (APM) wet etching 71
4.2.3 Stacked Nanowire Formation 73
4.2.4 Gate Patterning Conventional Patterning and Damascene Gate Formation 76
4.3 Electrical Characteristics of CSTAR having TiGer Structure 79
Chapter 5
Optimization for TiGer Structure 87
5.1 The Effects of Etching Slope 87
5.2 The Effects of Threshold Voltage of GST Variation 90
5.3 Dummy Word-Lines and BIL 93
Chapter 6
Conclusion 93
Bibliography 97
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dc.formatapplication/pdf-
dc.format.extent10653418 bytes-
dc.format.mediumapplication/pdf-
dc.language.isoen-
dc.publisher서울대학교 대학원-
dc.subject3-D stacked NAND flash memory-
dc.subjectNAND flash memory architecture-
dc.subjectchannel stacked NAND flash array-
dc.subjectnanowire charge trap flash-
dc.subject.ddc621-
dc.title3-Dimensional NAND flash memory having Tied Bit-line and Ground Select Transistor (TiGer)-
dc.title.alternative비트라인과 그라운드 선택 트랜지스터가 연결된 구조를 가지는 3차원 낸드 플래시 메모리-
dc.typeThesis-
dc.contributor.AlternativeAuthorPark, Se Hwan-
dc.description.degreeDoctor-
dc.citation.pagesvi, 104-
dc.contributor.affiliation공과대학 전기·컴퓨터공학부-
dc.date.awarded2014-08-
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