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유도결합 플라즈마 화학 기상 증착법을 이용한 TiB₂박막의 저온 증착 및 접착력 향상 기술에 관한 연구 : Deposition and adhesion enhancement of TiB2 coatings by inductively coupled plasma assisted CVD at low process temperature

DC Field Value Language
dc.contributor.advisor이정중-
dc.contributor.author이승훈-
dc.date.accessioned2009-11-18-
dc.date.available2009-11-18-
dc.date.copyright2006.-
dc.date.issued2006-
dc.identifier.urihttp://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000046487kor
dc.identifier.urihttps://hdl.handle.net/10371/12643-
dc.description학위논문(박사)--서울대학교 대학원 :재료공학부,2006.kor
dc.format.extentviii, 117 장kor
dc.language.isokokor
dc.publisher서울대학교 대학원kor
dc.subject유도결합 플라즈마kor
dc.subjectInductively coupled plasmakor
dc.subjectTiB2kor
dc.subjectTitanium diboridekor
dc.subject저온 코팅kor
dc.subjectLow temperature depositionkor
dc.subject농도경사kor
dc.subjectCompositionally gradient coatingkor
dc.subject접착력kor
dc.subjectAdhesionkor
dc.title유도결합 플라즈마 화학 기상 증착법을 이용한 TiB₂박막의 저온 증착 및 접착력 향상 기술에 관한 연구kor
dc.title.alternativeDeposition and adhesion enhancement of TiB2 coatings by inductively coupled plasma assisted CVD at low process temperaturekor
dc.typeThesis-
dc.contributor.department재료공학부-
dc.description.degreeDoctorkor
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