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Deposition behavior and dielectric properties of the Ti-based oxide films for memory devices : 메모리 소자에의 적용을 위한 TiO₂박막의 성장 거동 및 특성에 대한 연구
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.advisor | 황철성 | - |
| dc.contributor.author | 김성근 | - |
| dc.date.accessioned | 2009-11-18 | - |
| dc.date.available | 2009-11-18 | - |
| dc.date.copyright | 2007. | - |
| dc.date.issued | 2007 | - |
| dc.identifier.uri | http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000042915 | eng |
| dc.identifier.uri | https://hdl.handle.net/10371/12645 | - |
| dc.description | 학위논문(박사) --서울대학교 대학원 :재료공학부,2007. | eng |
| dc.format.extent | xiv, 190 p. | eng |
| dc.language.iso | en | eng |
| dc.publisher | 서울대학교 대학원 | eng |
| dc.subject | TiO2 | eng |
| dc.subject | Al-doped TiO2 | eng |
| dc.subject | high-k | eng |
| dc.subject | Atomic layer deposition (ALD) | eng |
| dc.subject | O3 | eng |
| dc.subject | DRAM | eng |
| dc.subject | capacitor | eng |
| dc.title | Deposition behavior and dielectric properties of the Ti-based oxide films for memory devices | eng |
| dc.title.alternative | 메모리 소자에의 적용을 위한 TiO₂박막의 성장 거동 및 특성에 대한 연구 | eng |
| dc.type | Thesis | - |
| dc.contributor.department | 재료공학부 | - |
| dc.description.degree | Doctor | eng |
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