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Preparation of the thin films by inductively coupled plasma assisted chemical vapor deposition and diagnostics of inductively coupled plasma : 유도결합 플라즈마 특성 분석 및 유도결합 플라즈마 화학기상증착법을 이용한 박막 증착
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.advisor | 이정중 | - |
| dc.contributor.author | 이동각 | - |
| dc.date.accessioned | 2009-11-18 | - |
| dc.date.available | 2009-11-18 | - |
| dc.date.copyright | 2004. | - |
| dc.date.issued | 2004 | - |
| dc.identifier.uri | http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000056738 | eng |
| dc.identifier.uri | https://hdl.handle.net/10371/12692 | - |
| dc.description | Thesis(doctoral)--서울대학교 대학원 :재료공학부,2004. | eng |
| dc.format.extent | xiii, 149 leaves | eng |
| dc.language.iso | en | - |
| dc.publisher | 서울대학교 대학원 | eng |
| dc.subject | 유도결합플라즈마 | eng |
| dc.subject | Inductively Coupled Plasma(ICP) | eng |
| dc.subject | 플라즈마 분석 | eng |
| dc.subject | Plasma Diagnostics | eng |
| dc.subject | 이온 에너지 분석 | eng |
| dc.subject | Ion Energy Analysis | eng |
| dc.subject | 화학적 기상증착법 | eng |
| dc.subject | Chemical Vapor Deposition(CVD) | eng |
| dc.subject | 경질피막 | eng |
| dc.subject | Hard Coatings | eng |
| dc.subject | Carbon Nitride | eng |
| dc.subject | Carbon Nitride | eng |
| dc.subject | Titanium Nitride | eng |
| dc.subject | Titanium Nitride | eng |
| dc.subject | 저온 증착. | eng |
| dc.subject | low temperature deposition | eng |
| dc.title | Preparation of the thin films by inductively coupled plasma assisted chemical vapor deposition and diagnostics of inductively coupled plasma | eng |
| dc.title.alternative | 유도결합 플라즈마 특성 분석 및 유도결합 플라즈마 화학기상증착법을 이용한 박막 증착 | eng |
| dc.type | Thesis | - |
| dc.contributor.department | 재료공학부 | - |
| dc.description.degree | Doctor | eng |
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