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Preparation of the thin films by inductively coupled plasma assisted chemical vapor deposition and diagnostics of inductively coupled plasma
유도결합 플라즈마 특성 분석 및 유도결합 플라즈마 화학기상증착법을 이용한 박막 증착

DC Field Value Language
dc.contributor.advisor이정중-
dc.contributor.author이동각-
dc.date.accessioned2009-11-18-
dc.date.available2009-11-18-
dc.date.copyright2004.-
dc.date.issued2004-
dc.identifier.urihttp://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000056738eng
dc.identifier.urihttps://hdl.handle.net/10371/12692-
dc.descriptionThesis(doctoral)--서울대학교 대학원 :재료공학부,2004.eng
dc.format.extentxiii, 149 leaveseng
dc.language.isoen-
dc.publisher서울대학교 대학원eng
dc.subject유도결합플라즈마eng
dc.subjectInductively Coupled Plasma(ICP)eng
dc.subject플라즈마 분석eng
dc.subjectPlasma Diagnosticseng
dc.subject이온 에너지 분석eng
dc.subjectIon Energy Analysiseng
dc.subject화학적 기상증착법eng
dc.subjectChemical Vapor Deposition(CVD)eng
dc.subject경질피막eng
dc.subjectHard Coatingseng
dc.subjectCarbon Nitrideeng
dc.subjectCarbon Nitrideeng
dc.subjectTitanium Nitrideeng
dc.subjectTitanium Nitrideeng
dc.subject저온 증착.eng
dc.subjectlow temperature depositioneng
dc.titlePreparation of the thin films by inductively coupled plasma assisted chemical vapor deposition and diagnostics of inductively coupled plasmaeng
dc.title.alternative유도결합 플라즈마 특성 분석 및 유도결합 플라즈마 화학기상증착법을 이용한 박막 증착eng
dc.typeThesis-
dc.contributor.department재료공학부-
dc.description.degreeDoctoreng
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College of Engineering/Engineering Practice School (공과대학/대학원)Dept. of Material Science and Engineering (재료공학부) Theses (Ph.D. / Sc.D._재료공학부)
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