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Preparation of the thin films by inductively coupled plasma assisted chemical vapor deposition and diagnostics of inductively coupled plasma : 유도결합 플라즈마 특성 분석 및 유도결합 플라즈마 화학기상증착법을 이용한 박막 증착
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- Authors
- Advisor
- 이정중
- Issue Date
- 2004
- Publisher
- 서울대학교 대학원
- Keywords
- 유도결합플라즈마 ; Inductively Coupled Plasma(ICP) ; 플라즈마 분석 ; Plasma Diagnostics ; 이온 에너지 분석 ; Ion Energy Analysis ; 화학적 기상증착법 ; Chemical Vapor Deposition(CVD) ; 경질피막 ; Hard Coatings ; Carbon Nitride ; Carbon Nitride ; Titanium Nitride ; Titanium Nitride ; 저온 증착. ; low temperature deposition
- Description
- Thesis(doctoral)--서울대학교 대학원 :재료공학부,2004.
- Language
- English
- URI
- http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000056738
https://hdl.handle.net/10371/12692
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