Manipulation in Shape and Arrangement of Nano Pattern Using Stretched Soft Molds

Abstract

Various methods for soft lithography have been developed due to the temporal and economical limitations of photo lithography, and still a lot of lithographical methods are being developed and studied to apply to different scientific fields. Here, we focus on nano-scale anisotropic patterns formed from a replica molding with curable polymers. We fabricate a stamp having an array of the patterns newly formed from a hexagonal pattern of tens of nanometers composed of dot-shaped vertices. We could successfully transform the dot-patterned feature to an ellipsoidal one and also manipulate its aspect ratio as desired. Furthermore, we were able to stretch the hexagonal pattern while keeping the dot shape the same, so we came up with a new pattern arrangement. Ultimately, we can notice the change in wetting property of materials having anisotropic structures.