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Showing results 1 to 7 of 7
Issue Date
Title / Author(s) / Citation
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1998
유기금속 화학증착법으로 제조된 고유전율 박막용 Pt 및 RuO₂전국의 특성분석
이종명
link
2009
Preparation and electrochemical performances of composite electrodes consisting of various kinds of substrates with electrochemically deposited RuO2 nanoparticles
안영락
link
2011-08
Growth behavior and characteristics of Ru based electrodes grown by CVD/ALD for next generation DRAM device
한정환
link
2014-08
Overcoming the Non-ideal Behavior of Atomic Layer Deposition of SrTiO3 Thin Films for DRAM Capacitor
이웅규
view file
2015-02
Evaluating Dielectric Thin Film for Next-generation DRAM Capacitor using Al-doped TiO2
전우진
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2017-08
Rutile 구조 TiO2의 ALD 진행 중 RuO2 기판 환원을 억제하기 위한 SnO2 박막 도입 평가
송호주
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2021
Modified atomic layer deposition processes of the Ru electrode thin films for next generation DRAM capacitor
권대선
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link
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