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Showing results 1 to 5 of 5

Issue Date	Title / Author(s) / Citation	File
2006	고밀도 CHF3 플라즈마에서 바이어스 전압과 이온의 입사각이 photoresist의 식각에 미치는 영향 강세구	link
2006	Etching of Si and SiO2 in fluorocarbon plasma : interaction between the sidewall and bottom surfaces, and methods of etch profile improvement 민재호	link
2009	(A) novel cyclic depositionetching process to obtain bowing-free SiO2 contact holes 이진관	link
2016-03	Contribution of surface energy and roughness to the wettability of polyamide 6 and polypropylene film in the plasma-induced process Kim, Joo Youn; Kim, Hey-sang; Park, Chung Hee Textile Research Journal, Vol.86 No.5, pp.461-471	DOI
2017-01	Influence of micro and nano-scale roughness on hydrophobicity of a plasma-treated woven fabric Park, Sohyun; Kim, Jooyoun; Park, Chung Hee Textile Research Journal, Vol.87 No.2, pp.193-207	DOI