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Deposition and property improvement of high-k dielectric materials for gate oxide of CMOS devices
CMOS 소자의 gate oxide용 고유전 유전막의 증착과 특성 개선에 관한 연구

DC Field Value Language
dc.contributor.advisor김형준-
dc.contributor.author엄다일-
dc.date.accessioned2009-11-18T22:17:34Z-
dc.date.available2009-11-18T22:17:34Z-
dc.date.copyright2008.-
dc.date.issued2008-
dc.identifier.urihttp://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000041526eng
dc.identifier.urihttps://hdl.handle.net/10371/13510-
dc.descriptionThesis(doctors) --서울대학교 대학원 :재료공학부,2008.8.eng
dc.format.extentxiv, 183 p.eng
dc.language.isoeneng
dc.publisher서울대학교 대학원eng
dc.subjecthigh-κeng
dc.subjecthigh-κeng
dc.subjectALDeng
dc.subjectALDeng
dc.subjectAl2O3eng
dc.subjectAl2O3eng
dc.subjectAlNeng
dc.subjectAlNeng
dc.subjectLa2O3eng
dc.subjectLa2O3eng
dc.subjectLaAlO3eng
dc.subjectLaAlO3 deposition behavioreng
dc.subject증착거동eng
dc.subjectUV treatmenteng
dc.subjectUV 처리eng
dc.subjectleakage current mechanismeng
dc.subject전도기구eng
dc.subjectthermal stabilityeng
dc.subject열적 안정성eng
dc.subjectXPSeng
dc.subjectXPSeng
dc.titleDeposition and property improvement of high-k dielectric materials for gate oxide of CMOS deviceseng
dc.title.alternativeCMOS 소자의 gate oxide용 고유전 유전막의 증착과 특성 개선에 관한 연구eng
dc.typeThesis-
dc.contributor.department재료공학부-
dc.description.degreeDoctoreng
Appears in Collections:
College of Engineering/Engineering Practice School (공과대학/대학원)Dept. of Materials Science and Engineering (재료공학부)Theses (Ph.D. / Sc.D._재료공학부)
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